Advanced Plasma, Inc.
1Patents
0Active
1Granted
24Portfolio score
Filing activity: Sep 27, 2004 → Sep 27, 2004
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7192505B2 | Wafer probe for measuring plasma and surface characteristics in plasma processing environments | Electricity | 38 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.