ASML Masktooks B.V.
2Patents
1Active
2Granted
35Portfolio score
Filing activity: Nov 5, 2004 → Apr 12, 2006 · 1 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7398508B2 | Eigen decomposition based OPC model | Physics | 19 | Expired |
| US7681171B2 | Method, program product and apparatus for performing double exposure lithography | Physics | 8 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.