Gray Scale Technologies, Inc.
2Patents
0Active
2Granted
25Portfolio score
Filing activity: Mar 26, 1999 → Mar 12, 2001
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6534221B2 | Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics | Physics | 20 | Expired |
| US6524755B2 | Phase-shift masks and methods of fabrication | Emerging Cross-Sectional Technologies | 14 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.