Hitachi, Ind.
1Patents
0Active
1Granted
21Portfolio score
Filing activity: May 17, 1989 → May 17, 1989
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5084402A | Method of fabricating a semiconductor substrate, and semiconductor device, having thick oxide films and groove isolation | Emerging Cross-Sectional Technologies | 3 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.