Plasma & Materials Technologies, Inc.
5Patents
0Active
5Granted
31Portfolio score
Filing activity: Jun 13, 1989 → Nov 20, 1992
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4990229A | High density plasma deposition and etching apparatus | Electricity | 265 | Expired |
| US5122251A | High density plasma deposition and etching apparatus | Electricity | 206 | Expired |
| US5429070A | High density plasma deposition and etching apparatus | Electricity | 196 | Expired |
| US5091049A | High density plasma deposition and etching apparatus | Electricity | 116 | Expired |
| US5421891A | High density plasma deposition and etching apparatus | Electricity | 99 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.