Bennett W. Olson
1Patents
1h-index
4Co-inventors
25Inventor score
Filing activity: Apr 14, 2009 → Apr 14, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8082524B2 | Mask patterns for use in multiple-exposure lithography | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.