Bill Kennedy
1Patents
1h-index
3Co-inventors
25Inventor score
Filing activity: Feb 14, 2002 → Feb 14, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6744212B2 | Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions | Electricity | 63 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.