David Van Steenwinckel
2Patents
2h-index
9Co-inventors
30Inventor score
Filing activity: Nov 13, 2007 → Dec 17, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8148052B2 | Double patterning for lithography to increase feature spatial density | Electricity | 32 | Active |
| US8348505B2 | Self-calibration circuit and method for junction temperature estimation | Electricity | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.