Inventor · Boise, ID, US

Ee Ee Eng

2Patents
1h-index
8Co-inventors
30Inventor score

Filing activity: Apr 19, 2018 → Oct 21, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US10483407B2 Methods of forming si3nX, methods of forming insulator material between a control gate and charge-storage material of a programmable charge-storage transistor, and methods of forming an array of elevationally-extending strings of memory cells and a programmable charge-storage transistor manufactured in accordance with methods Electricity 1 Active
US10749041B2 Programmable charge storage transistor, an array of elevationally-extending strings of memory cells, methods of forming Si3Nx, methods of forming insulator material that is between a control gate and charge-storage material of a programmable charge-storage transistor, methods of forming an array of elevationally-extending strings of memory cells, a programmable charge-storage transistor manufactured in accordance with methods, and an array of elevationally-extending strings of memory cells man Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.