Gary W. Read
1Patents
1h-index
4Co-inventors
25Inventor score
Filing activity: Jan 25, 1988 → Jan 25, 1988
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4798165A | Apparatus for chemical vapor deposition using an axially symmetric gas flow | Chemistry; Metallurgy | 70 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.