Gene E. Fuller
3Patents
2h-index
5Co-inventors
41Inventor score
Filing activity: Aug 16, 1974 → Nov 27, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4557797A | Resist process using anti-reflective coating | Emerging Cross-Sectional Technologies | 64 | Expired |
| US6686102B2 | Two-exposure phase shift photolithography with improved inter-feature separation | Physics | 5 | Expired |
| US3935457A | Dielectric material for dosimeters | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.