H. Christopher Hamaker
2Patents
2h-index
5Co-inventors
30Inventor score
Filing activity: Mar 28, 2000 → Jan 6, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6998217B2 | Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels | Physics | 21 | Expired |
| US6819450B1 | Enhanced edge resolution and critical dimension linearity in lithography | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.