Hiroshi Mohri
27Patents
10h-index
56Co-inventors
78Inventor score
Filing activity: Nov 27, 1978 → Jul 11, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5638103A | Method for recording and reproducing information, apparatus therefor and recording medium | Physics | 175 | Expired |
| US5161233A | Method for recording and reproducing information, apparatus therefor and recording medium | Physics | 66 | Expired |
| US5538816A | Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same | Emerging Cross-Sectional Technologies | 36 | Expired |
| US5380608A | Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide | Physics | 20 | Expired |
| US5811208A | Phase shift mask and method of producing the same | Physics | 14 | Expired |
| US5614335A | Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them | Physics | 13 | Expired |
| US5738959A | Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer | Physics | 12 | Expired |
| US5708062A | Bitumen compositions | Chemistry; Metallurgy | 11 | Expired |
| US5983057A | Color imaging system with selectively openable optical shutter | Physics | 10 | Expired |
| US5916712A | Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same | Physics | 10 | Expired |
| US5419988A | Photomask blank and phase shift photomask | Emerging Cross-Sectional Technologies | 10 | Expired |
| US4487890A | Process for producing impact resistant resins | Chemistry; Metallurgy | 9 | Expired |
| US6493013B2 | Method for recording and reproducing information, apparatus therefor and recording medium | Physics | 8 | Expired |
| US4173600A | Multi-stage sequentially produced polymer composition | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6458496B2 | Blank for halftone phase shift photomask and halftone phase shift photomask | Performing Operations; Transporting | 7 | Expired |
| US5561009A | Blanks for phase shift photomasks, and phase shift photomasks | Emerging Cross-Sectional Technologies | 6 | Expired |
| US8974987B2 | Photomask and methods for manufacturing and correcting photomask | Physics | 6 | Active |
| US5721075A | Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them | Physics | 5 | Expired |
| US5972543A | Phase shift mask and method of producing the same | Physics | 5 | Expired |
| US6709791B1 | Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this | Physics | 4 | Expired |
| US5576123A | Overlying shifter type phase shift photomask blank, overlying shifter type phase shift photomask and methods of producing them | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6764792B1 | Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it | Physics | 3 | Expired |
| US8124301B2 | Gradated photomask and its fabrication process | Physics | 3 | Active |
| US9519211B2 | Photomask and methods for manufacturing and correcting photomask | Physics | 2 | Active |
| US10048580B2 | Photomask and methods for manufacturing and correcting photomask | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.