Li Diao
4Patents
2h-index
8Co-inventors
37Inventor score
Filing activity: Jul 3, 2007 → Sep 30, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9396963B2 | Mask removal process strategy for vertical NAND device | Electricity | 4 | Active |
| US10431469B2 | Method for high aspect ratio photoresist removal in pure reducing plasma | Electricity | 2 | Active |
| US8093157B2 | Advanced processing technique and system for preserving tungsten in a device structure | Electricity | 1 | Active |
| US11107693B2 | Method for high aspect ratio photoresist removal in pure reducing plasma | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.