Lifan Yan
3Patents
1h-index
10Co-inventors
34Inventor score
Filing activity: Feb 25, 2020 → Dec 14, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11495461B2 | Film stack for lithography applications | Electricity | 1 | Active |
| US11550222B2 | Dose reduction of patterned metal oxide photoresists | Physics | 1 | Active |
| US11994800B2 | Dose reduction of patterned metal oxide photoresists | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.