Malcolm R. Howells
3Patents
3h-index
5Co-inventors
43Inventor score
Filing activity: Oct 8, 1991 → Aug 9, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6815363B2 | Method for nanomachining high aspect ratio structures | Performing Operations; Transporting | 31 | Expired |
| US5214685A | X-ray lithography mirror and method of making same | Physics | 13 | Expired |
| US5455850A | X-ray lithography using holographic images | Physics | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.