Inventor · Eindhoven, NL

Manuel Giollo

4Patents
0h-index
13Co-inventors
31Inventor score

Filing activity: Sep 28, 2017 → Jan 24, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US11327407B2 Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Physics 0 Active
US10877381B2 Methods of determining corrections for a patterning process Physics 0 Active
US11592753B2 Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Physics 0 Active
US11782349B2 Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.