Min-An Yang
5Patents
1h-index
16Co-inventors
40Inventor score
Filing activity: May 7, 2012 → Nov 23, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10845699B2 | Method for forming photomask and photolithography method | Physics | 1 | Active |
| US10508953B2 | Method and system for processing substrate by chemical solution in semiconductor manufacturing fabrication | Electricity | 1 | Active |
| US8703364B2 | Method for repairing photomask | Physics | 1 | Active |
| US10816891B2 | Photomask and fabrication method therefor | Physics | 0 | Active |
| US11307492B2 | Method for forming photomask and photolithography method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.