Inventor · Shanghai, CN

Mingying Ma

1Patents
0h-index
2Co-inventors
16Inventor score

Filing activity: Dec 25, 2006 → Dec 25, 2006

Most-cited inventions

PatentTitleAreaCited byStatus
US8035801B2 Method for in-situ aberration measurement of optical imaging system in lithographic tools Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.