Noam Knoll
2Patents
2h-index
11Co-inventors
41Inventor score
Filing activity: Mar 3, 1993 → Feb 23, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5438413A | Process for measuring overlay misregistration during semiconductor wafer fabrication | Physics | 126 | Expired |
| US7242477B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 83 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.