Ralph Kim
2Patents
1h-index
9Co-inventors
33Inventor score
Filing activity: Dec 17, 2003 → Apr 20, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7465673B2 | Method and apparatus for bilayer photoresist dry development | Physics | 4 | Expired |
| US8580075B2 | Method and system for introduction of an active material to a chemical process | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.