Tom Dorsh
3Patents
3h-index
21Co-inventors
50Inventor score
Filing activity: Sep 29, 2000 → Mar 31, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8728956B2 | Plasma activated conformal film deposition | Electricity | 520 | Active |
| US9230800B2 | Plasma activated conformal film deposition | Electricity | 40 | Active |
| US7037830B1 | PVD deposition process for enhanced properties of metal films | Electricity | 27 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.