Wei-Sung Lin
2Patents
1h-index
5Co-inventors
30Inventor score
Filing activity: May 4, 2016 → Aug 14, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9904176B2 | Interference lithography device | Physics | 1 | Active |
| US10859872B2 | Method to utilize force sensors to adjust the LCD pattern or brightness on a display | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.