Structured light projection using a compound patterned mask
US10001583B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2016 |
| Grant date | Jun 19, 2018 |
| Priority date | — |
| Expiry date | Aug 16, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B2215/05
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure describes structured light projection in which a structured light projector includes a light emitter and a compound patterned mask. The mask includes a spacer substrate that is transparent to a wavelength of light emitted by the light emitter. On a first side of the spacer substrate is a first reflective surface having apertures therein to allow light to pass through. Lenses are arranged to focus light, produced by the light emitter, toward the apertures in the first reflective surface. A second reflective surface on a second side of the spacer substrate opposite the first side has apertures therein to allow light passing through the spacer substrate to exit the compound patterned mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.