Systems and methods for determining the suitability of RF sources in ultraviolet systems
US10002752B2 · kind B2 · utility
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3References
24Claims
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Assignee
Inventor
Key dates
| Filing date | Jul 6, 2015 |
| Grant date | Jun 19, 2018 |
| Priority date | — |
| Expiry date | Jul 6, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01R13/05
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A UV system for irradiating a substrate includes a RF source capable of generating RF energy, a UV lamp capable of emitting UV energy when excited by the RF energy generated by the RF source, and a monitor coupled to the RF source. The monitor includes data relating to the RF source. The UV system further includes a controller capable of communication with the monitor, and the controller determines if the RF source is suitable for operation with the UV system based on the data of the monitor and/or the end of its useful life.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.