Methods and systems for producing high purity gaseous chlorine dioxide
US10005665B2 · kind B2 · utility
1Cited by
9References
18Claims
0Family size
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Key dates
| Filing date | Oct 8, 2015 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Jun 22, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2303/04
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
Methods and systems for producing high purity gaseous chlorine dioxide are provided. A solid chlorite reactant is contacted with an ozone-containing reactant gas, or a gas containing both ozone and a component that reacts with any hydroxide byproduct (such as carbon dioxide), to produce chlorine dioxide. The reaction can be monitored and controlled to ensure that excess chlorite reactant is provided and to prevent ozone from passing into the product gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.