Opaque quartz glass and method for its production
US10005693B2 · kind B2 · utility
0Cited by
6References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2015 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Feb 16, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2204/06
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
To provide opaque quartz glass having no water absorbing properties and being excellent in infrared light shielding properties, and a method for its production. In the production of opaque quartz glass of the present invention, a fine amorphous silica powder and a pore forming agent are mixed, then molded and heated at a predetermined temperature, to obtain opaque quartz glass wherein contained pores are closed pores, the average pore size of pores is from 5 to 20 μm, and the content density of pores is high, whereby the heat shielding properties are high.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.