Group 4 metal element-containing compound, method of preparing the same, precursor composition including the same for depositing film, and method of depositing film using the same
US10005795B1 · kind B1 · utility
1Cited by
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10Claims
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Key dates
| Filing date | Feb 3, 2017 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Feb 3, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present disclosure provides a Group 4 metal element-containing novel compound, a method of preparing the Group 4 metal element-containing compound, a precursor composition including the Group 4 metal element-containing compound for depositing a film, and a method of depositing a Group 4 metal element-containing film using the precursor composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.