Poly(thioaminal) probe based lithography
US10006936B2 · kind B2 · utility
7Cited by
40References
20Claims
0Family size
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Key dates
| Filing date | May 22, 2017 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | May 22, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.