Exposure device
US10007032B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2016 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | May 19, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention discloses an exposure device including: a mask plate, on which a mask pattern is provided; and a first micro lens layer, provided at a light outputting side of the mask plate, wherein the first micro lens layer utilizes light that passes through the mask plate to form a reduced real image of the mask pattern, the real image is located at one side of the first micro lens layer, and the mask plate is located at other side of the first micro lens layer. In the present invention, by utilizing the characteristics of micro lenses, a reduced real image for the mask patter is formed and then projected onto the substrate to be exposed, which effectively increases precision and resolution of exposure and reduces equipment cost and development cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.