Photosensitive and heat-resistant material, method for producing same and use thereof
US10008619B2 · kind B2 · utility
1Cited by
1References
16Claims
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Key dates
| Filing date | Mar 29, 2013 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Mar 29, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/60
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A tin-based material includes: from 50 to 100 wt. parts of grapheme; from 0 to 50 wt. parts of antimony-doped tin dioxide (ATO); from 0 to 50 wt. parts of indium-doped tin dioxide (ITO). The material includes at least ATO and/or ITO.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.