Patent · US Active

Evaporator and method for producing synthetic fused quartz

US10011518B2 · kind B2 · utility

2Cited by

11References

17Claims

0Family size

Assignee

HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

Klaus-Uwe BADEKE · Halle (Saale), DE
Martin Trommer · Bitterfeld-Wolfen, DE

Key dates

Filing date	Mar 12, 2014
Grant date	Jul 3, 2018
Priority date	—
Expiry date	Mar 12, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03B2207/87
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A method for manufacturing quartz glass, wherein (a) an appropriate liquid starting material is evaporated by spraying it into a vertically arranged evaporation chamber, (b) the vaporous starting material is oxidized to form SiO2, and the SiO2is collected. The method is characterized in that the starting material to be evaporated is sprayed in on the bottom of the evaporation chamber and the vaporous starting material is removed at the top end of the evaporation chamber, wherein the evaporation chamber is designed such that components depositing in the chamber accumulate on the bottom of the evaporator and are sprayed once again, as well as an evaporator for applying the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.