Method for treating antireflection coatings on an optical substrate, the thus obtained optical substrate and device for carrying gout said method
US10011522B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2004 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Sep 26, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Method for treating antireflection coatings on an optical substrate (17) involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterized in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer (21d) by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.