Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film
US10011675B2 · kind B2 · utility
0Cited by
4References
19Claims
0Family size
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Key dates
| Filing date | Dec 15, 2014 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Jul 12, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S525/915
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.