Automatic supply device for an industrial metal vapor generator
US10011905B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2012 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Oct 14, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/562
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a facility for the continuous vacuum deposition of a metal coating on a substrate in motion, comprising a vacuum deposition enclosure (24), at least one vapor jet deposition head (25,26) connected to an evaporator pot (9) designed to contain the coating metal in liquid form (11), through a vapor supply pipe (20) provided with a distribution valve (19), and a melting furnace (1) for said metal, said furnace being at atmospheric pressure, located below the lowest portion of the evaporator pot (9) and connected to the evaporator pot (9) by at least one automatic supply pipe (8) of the evaporator pot (9) provided with a supply pump (6) and by at least one liquid metal return pipe (8A,18) optionally provided with a valve (16,17), regulating means for the supply pump (6) further being present to regulate a determined liquid metal level in the evaporator pot (9), characterized in that it comprises, in each said supply and return pipes (8; 8A,18), a so-called heat valve area (7,13,15) provided with a heating device and a cooling device to obtain a regulated temperature, independent of that of the melting furnace (1), that prevailing in the remaining portion…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.