Laser source direction finding under non-uniform illumination conditions
US10012531B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2016 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Oct 29, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2001/446
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Techniques are provided for estimating the direction of a laser source under non-uniform illumination conditions such as laser speckle. An example system may include a detector array comprising sensors configured to detect the amplitude of the received laser signal. The sensors are disposed on the array at unique orientation angles relative to each other. The sensor size is selected based on the speckle pattern of the laser signal such that the sensors are small enough to be uniformly illuminated by the laser signal in the presence of speckle. The system also includes an amplitude ratio calculation circuit configured to calculate ratios of the amplitudes between each of two sensors of one or more pairs of sensors. The system further includes an angle of arrival calculation circuit configured to estimate the direction of the source of the laser signal based on the calculated ratios and the orientation angles of the sensors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.