Device for heating a substrate
US10014433B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2012 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Nov 14, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A device for heating a substrate according to a predetermined temperature profile for crystallizing a material on the substrate includes: a housing, at least a process chamber situated inside the housing and provided with a first and second opening for passing through a substrate, an inlet for introducing a process gas which includes the material in vapor phase into the chamber, at least two transport rollers attached to the housing for transporting the substrate into the chamber. The device further includes passage spaces for preventing the escape of process gas from the chamber to a space between the chamber and housing, which are situated near respective ends of the transport rollers in the chamber, the respective passage spaces having a first passage opening on an inner wall of the chamber, a second passage opening on an outer wall of the chamber and a first flange fixed around the transport roller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.