Retention system for aftertreatment module
US10024216B2 · kind B2 · utility
0Cited by
7References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2016 |
| Grant date | Jul 17, 2018 |
| Priority date | — |
| Expiry date | Dec 15, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/012
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A retention system for use with an aftertreatment module is disclosed. The retention system may include a first support mat disposed on at least one surface of the at least one catalyst substrate. The retention system may also include at least one support plate having a corrugated portion disposed on the first support mat. The retention system may further include a second support mat disposed on the corrugated portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.