Polymer composition and photoresist comprising same
US10025181B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Jun 21, 2012 |
| Grant date | Jul 17, 2018 |
| Priority date | — |
| Expiry date | Nov 20, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/382
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A polymer comprises the polymerized product of monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, and a photoacid-generating monomer; a chain transfer agent of the formula; wherein Z is a y valent C1-20 organic group, x is 0 or 1, Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl; and optionally, an initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.