Patent · US Active

Method and system for applying materials on a substrate

US10026617B2 · kind B2 · utility

0Cited by
32References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 26, 2016
Grant dateJul 17, 2018
Priority date
Expiry dateSep 16, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

Embodiments of the invention are directed to a method of printing lines. A method may include positioning a plurality of print units according to a predefined spacing parameter. A method may include depositing material on a substrate by a plurality of print units to form a respective plurality of parallel lines according to a predefined spacing parameter. A printing unit may be positioned at an angle with respect to a predefined scan direction such that a predefined width of a printed line is achieved. A substrate may be rotated between scans such that a plurality of lines in a respective plurality of directions is printed in a scan direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.