Substrate coating on one or more sides

US10030300B2 · kind B2 · utility

Assignee

• THYSSENKRUPP INDUSTRIAL SOLUTIONS AG · DE

Inventors

• Karl-Heinz Dulle · Olfen, DE
• Frank Funck · Oberhausen, DE
• Dirk Hoormann · Werne, DE
• Stefan Oelmann · Hemer, DE
• Peter Woltering · Neuenkirchen, DE
• Carsten Schmitt · Hagen, DE
• Philipp Hofmann · Munich, DE
• Ulf-Steffen Baeumer · Unna, DE

Key dates

• Filing date: May 23, 2011
• Grant date: Jul 24, 2018
• Expiry date: Nov 9, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E60/50
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for coating a substrate on one or more sides having catalytically active material producible by material deposition under vacuum in a vacuum chamber, using the following steps: loading a substrate in the chamber evacuating the chamber, cleaning the substrate by introducing a gaseous reducing agent, removing the gaseous reducing agent, applying an intermediate layer by means of vacuum arc evaporation, wherein a substrate comprising the same or similar material is introduced into the vacuum chamber, controlling the chamber temperature, coating by vacuum arc evaporation, a metal taken from the group ruthenium, iridium, titanium and mixtures thereof while oxygen is supplied, in a last step the coated substrate is removed from the chamber, wherein at least 99% of the substrate coating is free of constituents originally contained in the substrate itself, and at least 99% of the coating applied on the intermediate layer is kept free of non-oxidized metals.