Sintered body comprising LiCoO2, sputtering target, and production method for sintered body comprising LiCoO2
US10030302B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2014 |
| Grant date | Jul 24, 2018 |
| Priority date | — |
| Expiry date | Aug 31, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is a sintered body comprising LiCoO2 used for a sputtering target. The area A of a surface of the sintered body that corresponds to a sputtering surface is 200-1500 cm2 and the relative density of the entire sintered body is 75% or higher. When B1 represents the area of a region in which the area ratio that is occupied by pores is 10% or higher in the surface that corresponds to a sputtering surface, the ratio of B1 to the area A is 50% or higher, and the area B2 of a region having a specific resistance of 1.0×102 Ω-cm or smaller in the surface that corresponds to a sputtering surface occupies 25% or more of the area A.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.