Liquid application system
US10035163B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2014 |
| Grant date | Jul 31, 2018 |
| Priority date | — |
| Expiry date | Dec 14, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB27N3/18
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
It is provided in a liquid application system for applying liquid to a material cake transported on a conveyor device having a liquid application device, that the conveyor device comprises a porous section on which the material cake lies or which the material cake contacts and which is permeable for a liquid to be applied, that the liquid application device comprises an application device via which the liquid to be applied can be applied to the side of the porous section of the conveyor device facing away from the material cake, and that the liquid application device comprises an overpressure chamber having a first overpressure relative to the environment by which the porous section of the conveyor device passes, wherein the applied liquid can be transported via the first overpressure through the porous section of the conveyor device or held via the first overpressure to the porous section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.