Patent · US Active

Method and apparatus for uniform illumination of a surface

US10036538B2 · kind B2 · utility

1Cited by
9References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 13, 2014
Grant dateJul 31, 2018
Priority date
Expiry dateJan 25, 2035

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF21Y2115/10
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a lighting system (10) that illuminates a surface (16) with a uniform illumination pattern (12). The lighting system includes a plurality of lighting units (14) that each emit a light beam that has a variable vertical illumination distribution and a variable horizontal illumination distribution. The intensity of each light beam is uniform in a central region of the horizontal illumination distribution, and non-uniform at each end of the horizontal illumination distribution. Similarly, the intensity of each light beam is uniform in a central region of the vertical illumination distribution, and largely non-uniform at each end of the vertical illumination distribution. The light beams overlap in the region of horizontal nonuniformity in order to create an illumination pattern that appears uniform.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.