Patent · US Active

Cleaning system for cleaning a photoconductive surface

US10036992B2 · kind B2 · utility

0Cited by

9References

15Claims

0Family size

Assignee

HP INDIGO B.V. · NL

Inventors

Shmuel Borenstain · Nes Ziona, IL
David Meshulam · Nes Ziona, IL
Amir Kedem · Nes Ziona, IL

Key dates

Filing date	Apr 15, 2015
Grant date	Jul 31, 2018
Priority date	—
Expiry date	Apr 15, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG03G21/0088
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Cleaning a photoconductive surface (16) from particles and excess fluid with at least two wiper blades, wherein a first wiper blade (12) is to contact the photoconductive surface (16) and to wipe at least some of the particles and at least some of the excess fluid from the photoconductive surface (16) and wherein a second wiper blade (14) is to contact the photoconductive surface (16) and to wipe at least some of the particles and at least some of the excess fluid that have passed the first wiper blade, from the photoconductive surface (16).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.