Metal complexes for use as dopants and other uses

US10038150B2 · kind B2 · utility

Assignee

• ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) · CH

Inventors

• Julian Burschka · Darmstadt, DE
• Florian Kessler · Höchstadt an der Aisch, DE
• Etienne David Baranoff · Birmingham, GB
• Mohammad Khaja Nazeeruddin · Ecublens, CH
• Michael Graetzel · Yverdon-les-Bains, CH
• Shaik Mohammed Zakeeruddin · Vevey, CH
• Anders Hagfeldt · Morges, CH
• Marina Freitag · Uppsala, SE
• Fabrizio Giordano · Yverdon-les-Bains, CH

Key dates

• Filing date: Apr 14, 2016
• Grant date: Jul 31, 2018
• Expiry date: Apr 14, 2036

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E10/549
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

The invention relates to electrochemical devices comprising complexes of cobalt comprising at least one ligand with a 5- or six membered, N-containing heteroring. The complex are useful as p- and n-dopants, as over of electrochemical devices, in particular in organic semiconductors. The complexes are further useful as over-discharge prevention and overvoltage protection agents.