Method for treating a semiconductor device
US10041904B2 · kind B2 · utility
4Cited by
23References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2017 |
| Grant date | Aug 7, 2018 |
| Priority date | — |
| Expiry date | Sep 14, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/5027
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.