System and method of low-power plasma generation based on high-voltage plasmatron
US10045432B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 20, 2017 |
| Grant date | Aug 7, 2018 |
| Priority date | — |
| Expiry date | Oct 20, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/3431
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generation system includes an anode having a generally cylindrical proximal portion and a generally cylindrical distal portion, the distal portion having a smaller diameter than the first portion; a connecting portion connecting the first and second portions and having walls oriented at approximately 45 degrees to center axis of the anode; a cathode having a generally cylindrical shape in its proximal portion and a tapering at approximately a 30 degree angle to the center axis of the anode in its distal portion, where a gap between the connecting portion of the anode and the distal portion of the cathode is at least twice as large as a gap between the proximal portion of the anode and the proximal portion of the cathode; and a high voltage power supply providing an operating voltage in a range of 800-2500 volts and a current of about 0.3-0.7 A to the cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.