Quantum dot color filter substrate and manufacturing method thereof
US10048412B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 28, 2015 |
| Grant date | Aug 14, 2018 |
| Priority date | — |
| Expiry date | Feb 20, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/812
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses high power UV light irradiation on the QD material in the QD gel for prolonged period of time to perform selective quenching to obtain a selectively quenched QD layer, i.e., patterning the QD layer without etching process, achieve simplifying the QD CF substrate manufacturing process and reduce production cost. The QD CF substrate uses selectively quenched QD layer obtain by UV light irradiation technology to achieve improve the color gamut of display as well as simplifying manufacturing process. Moreover, the QD layer comprises no blue QD material, but uses blue backlight and organic transparent photo-resist layer to improve light utilization efficiency as well as reduce material cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.