Photo-imprinting resin composition, photo-imprinting resin film and patterning process
US10048582B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Mar 30, 2016 |
| Grant date | Aug 14, 2018 |
| Priority date | — |
| Expiry date | Apr 18, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/032
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photo-imprinting resin composition, a photo-imprinting resin film and a patterning process are provided. The photo-imprinting resin composition includes a novolac resin; a monomer having acrylic group, a polymer having acrylic group or a combination thereof; and a radical type photopolymerization initiator. The novolac resin has a Mw of 500 to 50000. The novolac resin does not react with the monomer having acrylic group nor the polymer having acrylic group described above.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.